Mask related
Large Size Photomask Inspection System
51MD
| High speed inspection of large size Photomask with sub-micron sensitivity |
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Applications
- Inspection system for Photomasks applied to LCD of large sized substrate
- Out going quality inspection of Photomasks
- Incoming Photomask inspection and regular quality inspection
Features
- Inspection of large sized mask substrates up to 1300mm x 1500mm (51MD)
- Photomask inspection either by the "Die to Die inspection method" that compares adjacent dies (chips) or by the "Die to Data Base inspection method" that compares die to design data (Data Base), is available.
- Furthermore, because the "Cell Shift" method that compares the same patterns when one type of pattern is repeated, is available and very high sensitivity inspection is realized, accordingly.
- There is an optional high sensitivity function that performs with higher speed of 2.5 times that of the conventional systems.
- Lightsome loading mechanism is equipped to be compatible with bending of large sized substrate.
Specifications
| Mask size | 1300mm x 1500mm (51MD:Maximum) |
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| Inspection sensitivity | 0.75um (Standard sensitivity), 0.3um (Optional sensitivity) |
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| Inspection speed | 3.14 sec/cm2 (when standard sensitivity), 20 sec/cm2 (when option is equipped for high sensitivity inspection) |
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