A pellicle inspection and pellicle mounting system for 51MD

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• Automatic transportation and mounting of a pellicle in a large size photomask production process.
• Particle inspection on a pellicle surface by reflective scattering light (Quality verification inspection of a pellicle)

• This one system completes from inspection to tentative and final mounting of a pellicle.
• By connecting this system with 51MD, particle adherence on photomasks and pellicles is remarkably reduced.
• Equipping of an ionizer keeps clean environment preventing particle adherence and prevents productivity deterioration caused by re-mounting of pellicles.
• The jigs for clamping a pellicle are stored in a stocker by different sizes and various sizes of pellicles can be appropriately processed, accordingly.
• Exfoliate paper is peeled off without excess stress due to detection of tensile strength at the clamping position when a pellicle is pulled out from the transport case.
• Alignment operation is available, while mounting a pellicle, by measuring the distance between the mask edges and pellicle edges by CCD cameras set at four positions.
• High operability is realized by equipping an automatic particle inspection function on a pellicle surface, a review function, a function to eliminate particles by Air Blow and a function to reverse the front and the back surfaces.
• This system works effectively for quality management and defective pellicle analysis, besides Good/No Good verification, because the detect particles can be observed either under bright view or under dark view and image data of particles can be storable.
• After tentatively mounting a pellicle on a photomask, the pillicle / photomask is transported to a nearby press machine. In the press machine, a number of sucking pads that utilize atmospheric pressure are installed at regular interval and final mounting of pellicle can be performed by application of constant pressure and time.