Large Size Photomask Substrates/Blanks Inspection System

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1)Quality management of glass substrates after precision polishing and cleaning
2)Confirmation of substrate quality before and after layer formation
3)Incoming inspection of large size Photomask blanks

• Differential interference optics makes nm order surface irregularity detectable.
  (detectable horizontal dimension is 1.0μm or larger)
  
• Laser scattering detection is installed and sensitivity for foreign particles is high (1.0μm).
  
• Verification of defect classification is performed based on input signal intensity from each sensor for differential interference, forward scattering and backward scattering.
  
• Tow sets of inspection head is installed to enable simultaneous inspection of front and back surfaces of a glass substrate.(The head for back surface inspection is optional)
  
• The system is compatible with substrate size up to 2.0 m x 2.0 m and speedily responds to the demand for inspection of substrates for large size Photomask of G10, the substrates being scheduled to be put into mass production in autumn 2008.
  
• Mechanism that moves head on a fixed mask substrate makes outer dimension and footprint compact.
  
• The system consistently performs from inspection to review with an easy-to-use and well-developed software.