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Wafer related
SiC Wafer Inspection/Review System
[WASAVI Series SICA61]
SiC wafer defect inspection/review system that detects and
reviews crystal defects with high resolution |
![SiC Wafer Inspection/Review System [WASAVI Series SICA61]](../../member/iwm_admin/product_image/product_113_big_SICA61.jpg) |
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Applications
- Evaluation and analysis of SiC epitaxial crystal growth processes
- Process management of SiC wafer manufacturing
- Outgoing and incoming inspection of SiC wafers
Features
- Combination of confocal optics and differential interferometry best suited for SiC wafer
- Detect crystal defects such as shell pit, stacking fault, carrot and such with high sensitivity
- Stable defect inspection free from effect of reflected light at the back-surface
- Review function of high resolution
- Defect map display function, defect classification function and high resolution 3D shape measurement function
Specifications
| Tool dimensions (mm) | 800 (W) x 1000 (D) x 1800 (H) |
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| Wafer size for inspection (mm) | 6 inchφmaximum |
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| Type of wafer for inspection | Bulk SiC, SiC with epitaxial layers |
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| Throughput | 1 wafer (3 inch φ) / hour |
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