SiC wafer defect inspection/review system that detects andreviews crystal defects with high resolution
High resolution visualizing system catches thickness variation/CD error in a very small area over the whole wafer surface
High-speed warpage/Stress inspection for patterned wafers
High Accuracy Depth Inspection System for TSV Formation Process
High sensitivity defect inspection/review system, implementing minute defect detection required by the next generation processes
High-sensitivity inspection/review system for various kinds of bare wafers that are compatible with 90nm generation and further
Remove and prevent growth of haze on photomask with pellicle attached
Photomask inspection system for semiconductor devices of 45nm node and further
Photomask inspection system for semiconductor devices of 65nm node and further
A high speed and high sensitivity particle inspection system compatible with photomasks for semiconductor devices with 90nm node and further
Mask Blanks Inspection Systems that achieve both high sensitivity and high throughput simultaneously
Maskblanks Inspection System simultaneously achieving high sensitivity and high throughput
Product quality monitoring at all the Photomask manufacturing processes
An EUVL Mask Substrates / Blanks Inspection System Jointly Developed with SEMATECH
High sensitivity inspection of Mask Substrates for Photomasks and EUVL
Phase shift and transmittance of Phtomask become measurable after cleaning and pellicle mounting
A de facto standard phase-shift measurement system for ArF wavelength
A de facto standard phase-shift measurement system for KrF wavelength
Measures etching quantity of glass substrate with resist remained as is
Defect review by the same wavelength as exposure wavelength
Defect review with high resolution after defect inspection
Photomask contamination quantity measurement system, the very first of this kind in the industry
Measure PCB warpage and parts height in 3D with high-speed and non-contact