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Transparent Object Inspection System WASAVI Series TROIS33NEW

High sensitivity defect inspection/review system that inspects GaN on Si and transparent wafers with high speed

  • Basic Information

Features

  • Confocal optics optimized for transparent wafers enables TROIS33 to perform inspections reliably without interference of reflected light from the back surface.
  • Differential interference optics provides high sensitivity detection of various crystal defects including shallow scratch.
  • With the use of a wavelength selection function based on a broadband light source and optical filters that eliminate effects of film interference, TROIS33 can perform inspections under optimal conditions for each wafer and film.
  • Our proprietary algorithm eliminates influence of surface morphology not originating from defects.
  • Furnished with a defect mapping function, a defect classification function and a marking function, TROIS33 supports defect analyses.

Applications

  • Inspection of defects on wide-bandgap semiconductors, sapphires, quartz and other transparent wafers
  • Inspection of defects on homo/hetero-epitaxial layers of wide-bandgap semiconductors
  • Epitaxial growth process management and equipment management
  • Development of polishing materials and management of polishing process
  • Inspection of pattern defects on transparent wafers

Specifications

External dimensions 2,200mm(W) x 1,850mm(D) x 2,000mm(H) (for the type of 6 inch specification) ※Including Main body, Rack and Operation desk
Applicable wafer size Maximum φ8 inch
Applicable wafer type GaN and various transparent wafers
Inspection time 10 minutes per wafer (with φ6 inch wafer and 10x lens)
  • Basic Information

Terms related to this series

Contact

Please feel free to contact us by sending us a request from below or by calling us at the phone number on the right.

045-478-7330

Request for Product BrochureRequest for Product DemonstrationRequest for Technical Consultation

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