PRODUCTS
Glossary
A B C D E F G H I J K L M
N O P Q R S T U V W X Y Z
E
EAPSM , Att-PSM
EB
EPL
Etching
EUV
EUVL
EAPSM Att-PSM
Embedded Attenuated Phase Shift Mask
Attenuated Phase Shift Mask
Alias name for half tone type phase shift mask.
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EB
Electron Beam
Lithography (exposure) tool for circuit patterns using electron beam.
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EPL
Electron Projection Lithography
One type of lithography that uses electron beam projection system
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Etching
One process method.
By using chemicals or gases, such as acids or alkalis, removal of materials is performed.
This process enables removal of materials of unnecessary part.
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EUV
Extreme Ultraviolet
Exposure light source
Light wavelength: 13.5nm
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EUVL
Lithography using light source of EUV.
Extra Ultra Violet Light Lithography
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