PRODUCTS
Glossary
A B C D E F G H I J K L M
N O P Q R S T U V W X Y Z
P
Patch Work
PDP
Pellicle
Phase Shift Angle
Phosphorous
Photo Resist
Photomask
Polishing
PSM
Patch Work
A function of making a single large image data with a combination of each image data by moving its sampling point.
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PDP
Plasma Display Panel
A display in which plasma discharge is controlled at each pixel.
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Pellicle
Protective film used for preventing foreign particle to directly adhere to circuit pattern on Photomask.
Since it is placed several millimeter ahead of the pattern surface, small particles on a pellicle are not projected on wafer.
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Phase Shift Angle
Phase shift angle of light
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Phosphorous
An element with atomic number of 15. Atomic symbol is P (Phosphorous)
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Photo Resist
Material that undergoes chemical reaction (or chemical change) when irradiated by light.
By developing after light irradiation, the portion of resist material irradiated by light either remains or be solved away.
Photoresist is thinly coated on wafer surface to be used for etching or masking for ion implantation. (Not only for mechanical processing)
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Photomask
Protective film used for preventing foreign particle to directly adhere to circuit pattern on Photomask.
Since it is placed several millimeter ahead of the pattern surface, small particles on a pellicle are not projected on wafer.
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Polishing
A method to obtain high quality mirror surface of wafer, by using mixture of working fluid and powder finer than lapping powder, and by setting polishing fabric with enough flexibility and viscoelasticity on a bed to perform polishing on wafer in this configuration.
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PSM
Phase Shift Mask
A photomask with a function of light phase shift or light intensity change aiming to achieve a higher resolution by depositting some material with a different refractive index or with a different transmissivity, or by partly changing the thickness of the mask.
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