Mask related
LCD Large Photomask In-process Repair System
LR51
| High quality repair of microscopic defects in large size mask |
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Applications
- Repair of white defects and black defects in large size Photomask manufacturing process
Features
- White defects and black defects after exposure and development of mask resist patterns can be repaired. Because repair can be conducted in the state of resist patterns, damages and contamination on glass by laser irradiation do not occur and furthermore, layer structure (CrO/Cr) of shielding part can be maintained, which provide high quality repair, compared with the conventional repair method that is performed after etching.
- A mechanism to protect the laser repair spot by a cover film in order to prevent contamination by resist debris generated by laser irradiation, is equipped.
- Masks as large as 1500mm × 1300mm maximum can be processed.
Specifications
| Main body outer dimension | 2650mm(W) × 3050mm(D) × 2931mm (H) |
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| Controller dimension | 940mm(W) × 700mm(D) × 2000mm (H) |
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| Weight | about 6000Kg |
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| Basic functions | Black defects repair function by laser
White defects repair function by high precision dispenser |
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