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Maskblanks Inspection System

M3320
Maskblanks Inspection System simultaneously achieving high sensitivity and high throughput Maskblanks Inspection System M3320
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Applications

  • Inspection of mask substrates and blanks
  • Review and measurements of defects

Features

  • In-line inspection system for mask blanks
  • Inspection of wide variety of mask blanks such as glass substrates, chromium films, half-tone films, resist films, and so on
  • Impressively high defect detection sensitivity is achieved while maintaining the same degree of high throughput as that of the conventional systems.
  • Defect inspection of substrate surface without the effect of substrate surface reflection at all, due to the employment of the laser confocal optics that realizes high resolution without flare and high S/N ratio
  • Because the defect detection sensitivity of laser confocal optics does not depend on reflectivity of substrates, high sensitivity detection of shallow scratches on a glass substrate surface or on a half tone film is possible.
  • Observation of 3D features of detected defects is possible by laser confocal optics.
  • Function that automatically determines whether the detected defect is scratch or foreign particle is installed.
  • Maximum of 5 cassettes are mountable and output/input configuration is flexibly settable.

Specifications

Substrate Size6025
Defect Detection Sensitivity0.10um (Particle, Pinhole)
Inspection Time5minutes (142mmx142mm)
Light SourceArgon Ion Laser (488nm)
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