Mask related
Mask Substrate Inspection System
M3350
| High sensitivity inspection of Mask Substrates for Photomasks and EUVL |
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Applications
- Inspection of substrates for photomasks
- Inspection of mask substrates for EUVL
- Defect review and classification
Features
- Detection sensitivity of 50nm on Qz substrate is established by using a newly adopted high power 1W laser.
- High resolution defect review function realized by confocal optics.
- Realization of more accurate defect coordinate data based on a high precision stage employing air spring and linear motor.
- Marking by a diamond chip is available.
Specifications
| Substrate Size | Solely for 6025 |
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| Detection Sensitivity | 50nm (Normal Mode) |
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| Inspection Time | 23 minutes (Normal mode at 146mm × 146mm) |
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| Wavelength of inspection light source | 488 nm |
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