Wafer Inspection/Review System

• Inspection of various kinds of wafer such as mirror polished wafer, annealed wafer, epitaxial wafer, film deposited wafer like SOI and so on .
• Review and measurement of defects.

• Realization of high defect detection sensitivity by employing a laser confocal optics
• The bright field method employed in this system provides higher sensitivity detection than the laser scattering method.
• This one system is capable of both inspection and defect review.
• Realized high speed inspection of 3.1billion pixels/sec at maximum using 33 multi laser beams.
• Provides high resolution defect review by confocal optics.
• Employment of a high-power laser
• Installation of excellent Automatic Defect Classification function that automatically determines whether the detected defect is a scratch or a foreign particle by using an image recognition system
• Realizes exact defect coordinate data by the high precision air slide stage.
• Marking of defect portion by dust-free diamond chip is available

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