Mask related
Maskblanks Inspection System
M6640 / 6641
| Mask Blanks Inspection Systems that achieve both high sensitivity and high throughput simultaneously |
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Applications
- Inspection of Qz Substrates, Cr Mask Blanks, MoSi Mask Blanks and Mask Blanks with resist coating
- Defect review and measurement
Features
- High sensitivity / High Throughput
- M6641 is equipped with Dense Scan Mode (higher sensitivity inspection) and capable of inspecting Line & Space monitor patterns by selecting Dense Scan Mode.
- High resolution defect review can be performed by confocal optics.
- Dust-free marking by diamond chip is available.
Specifications
| Wavelength of inspection light source | 532nm |
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| Detection sensitivity | 60nm (PSL on quartz substrate, Normal Mode) |
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| Inspection time | 12 minutes (Normal mode over 140mm x 140mm area) |
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| Compatible substrate size | 6025 |
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- Most advanced Mask Blanks Inspection Systems that simultaneously achieve high sensitivity effective for inspection of the next generation high quality mask blanks and high throughput compatible with 100% inspection.
- Based on the key technology of MAGICS that has become a de facto standard in the industry, the new systems are equipped with light weight / low gravity stage with halved acceleration and deceleration speed, and equipped with a newly developed multi beam generator for 63 beams.
