Mask related
EUVL Mask Substrates / Blanks Inspection System
M7360
| An EUVL Mask Substrates / Blanks Inspection System Jointly Developed with SEMATECH |
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- The EUVL is expected to come into practical use for device production of 32nm HP node and further. M7360 is an indispensable tool for development of Mask Substrates and Mask Blanks for EUVL application.
- The core technologies of MAGICS that is already a de facto standard in the mask blanks inspection tool industry and the 4-year joint development result by Lasertec and SEMATECH, has come to fruition of the M7360 that has the highest blanks inspection performance in the world.
Applications
- Particle inspection of Mask Substrates and Mask Blanks for EUVL
- Review and measurement of defects (particles)
Features
- High Sensitivity, High Resolution, High Contrast and nearly Flare Free
- High throughput
- Free from influences by haze or color shades and inspection is possible on all kinds of substrates in the mask blanks production processes
- High resolution defect review by confocal optics
- Dust free marking by diamond chip
Specifications
| Wavelength of inspection light | 266nm |
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| Detection sensitivity | 30nm |
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| Throughput | 1 hour / substrate |
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| Mask size | 6025 |
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