Mask Contamination Monitoring System

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• Chemical contamination quantity measurement on photomask surface
• Quality control of photomask against haze (foreign material with growth potential

• A mask contamination monitor, the first of this kind in the industry, that can measure contamination quantity of photomask
• Can monitor contamination of one molecular layer level with a non-contact optical method.
• Due to ability to quantitatively measure contamination, the system is best suited to development of contamination prevention technologies.
• Best suited to mask contamination management at device production
• Local layer thickness distribution measurement resulting from contaminant aggregation process is possible in addition to constant layer thickness measurement.
• Measures contamination layer thickness on a patterned surface through mask glass substrate, utilizing optical phase shift. Pellicle mounting does not affect the measurement,accordingly.
• Automatic measurement is available by pattern recognition of the measuring pattern.