Mask related
Phase-Shift Measurement System
MPM193
| A de facto standard phase-shift measurement system for ArF wavelength |
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Applications
- Phase-Shift Measurement of phase-shift masks
- Transmittance measurement of Att-PSM's (Half-tone type phase-shift masks)
Features
- Phase-shift measurement system for ArF (193nm), which is now the de facto standard in the industry
- Directly measures phase-shift with the same wavelength as the exposure wavelength of steppers.
- Can measure transmittance of Att-PSM's (Half-tone type phase-shift masks).
- Realized high stability against floor vibration, and air turbulence within the system.
Specifications
| Substrate Size | 6025 |
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| Measurement Wavelength | 193nm |
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| Measurement Repeatability | Phase-shift measurement: 0.5°(3σ)
Transmittance measurement: 0.2% (3σ) |
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