Mask related
Phase Shift/Transmittance Measurement System
MPM193EX
| Phase shift and transmittance of Phtomask become measurable after cleaning and pellicle mounting |
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Applications
- Phase shift measurement of phase shift mask (PSM)
- Transmittance measurement of attenuated or half tone PSM
- Mask defect review (Option)
Features
- Measurement performance is remarkably improved as a successor system to MPM193 Phase Shift Measurement System that has been a de facto standard in the industry.
- Masks with pellicle mounted can be measured.
- Auto inspection function is significantly improved compared with that of the conventional system.
- Phase Shift measurement over micro area of 1μm scale or less is possible.
- Autoloader and mini-environment with chemical filter are standard components.
- Tool platform is common with that of MRS193EX and a function for mask defect review can be added as an option.
Specifications
| Measurement wavelength | 193 nm |
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| Measurement repeatability | 0.2°(3σ), 0.04% (3σ) |
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| Substrate size | 6025 |
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