Mask related
ArF Mask Review Station
MRS193EX
| Defect review by the same wavelength as exposure wavelength |
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Applications
- Mask defect review after defect inspection
- Defect size measurement
- Verification assistance for particles (cleanable) and pattern defects (need to be repaired)
- Measurement of phase shift and transmittance (option)
Features
- Mask defect review system most suited for defect observation after defect inspection in the Photomask manufacturing procedure
- Powerful tool for review of mask patterns and defects of 100nm and smaller because of higher resolution implemented by employing a light source of shorter wavelength.
- Masks with pellicle mounted are observable.
- Defects can be observed very easily based on coordinate data sent from inspection tools due to the employment of a high precision stage.
- Defect highlight display is available after automatically detecting the defective area within the viewing field.
- Tool platform is common with that of MPM193EX and a function for measuring phase difference/transmittance can be added as an option.
- 3D measurement becomes available by installing an AFM as an option.
- Linkage with simulation software for defect transferability is available (Option)
Specifications
| Light Source | 193 nm Excimer Laser |
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| Coordinate resolution of stage | 0.1μm |
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| Coordinate accuracy of stage | 2μm or less |
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| Substrate size | 6025 |
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| Viewing field size | 64μm x 51μm
16μm x 13μm (4x zoom image) |
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