DUV Mask Review Station

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• Mask defect review after defect inspection
• Defect size measurement and evaluation of transferability
• Determination support between foreign particles (washable) and pattern defects (needs repair)
• 3D configuration measurement of phase defect (glass defect)
• Development of masks for the next generation lithography

• A mask defect review system best suited for defect observation after defect inspection in Photomask manufacturing processes
• Letting the high priced inspection machine concentrate on defect inspection and letting MRS248 confirm defects, MRS248 will contribute to betterment of overall throughput and cost reduction.
• Can perform high resolution observation with pellicle mounted while maintaining high N.A.
• Can observe defect in a simple manner utilizing coordinate sent from defect inspection system, based on a high precision stage integrated.
• Can display highlight after automatically detecting defective part within the field of view.
• Phase image display of reflective light is available and convexo-concavity determination of defective area is easily performed.
• Installation is easy with very compact system that does not occupy large space and can be operated only connecting to electricity and dry air
• Coordination with defect printability simulation software is available
• 3D measurement by AFM is available (option)