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Mask related
Haze Removal System
PROMAHAZE
| Remove and prevent growth of haze on photomask with pellicle attached |
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Applications
- Removal of haze on photomasks at wafer fabs
- Total photomask management at wafer fabs including verification of haze generation situation and confirmation of photomask status after haze removal in addition to measurement and confirmation of phase shift/transmittance, by coordinated operation of the haze removal system PROMAHAZE with the photomask inspection system MATRICS and the phase shift/transmittance measurement system MPM193EX.
Features
- Enable haze cleaning of photomasks with pellicle attached
- Substitute air inside the pellicle frame with chemically clean air
- High-throughput haze cleaning by high-speed irradiation over the whole photomask area
- Local haze cleaning by spot irradiation
- Haze image review function based on a defect coordinate file and high resolution optics
Specifications
| Tool dimensions (excluding protrusive portion) | 1550 (W) x 2540 (D) x 2400 (H) mm |
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| Weight of the main body | 3200 Kg |
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| Observation wavelength | 248 nm |
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| Irradiation time | Less than 2.5 hours |
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