Mask related
APSM Etching Monitor
QSM400
| Measures etching quantity of glass substrate with resist remained as is |
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Applications
- Measures glass etching quantity of Alternating PSM's
Features
- Measures by a laser interference confocal optics from the back side of the mask substrate using objective lens with substrate thickness offset.
- Because etching quantity of glass substrate can be measured with resist remained as is, the additional etching process can be performed.
- Realized high precision measurement by utilizing a shearing interference optics that has strong resistance against disturbance from outside.
- Achieved high positioning accuracy and at the same time minimized particle generation, by employing a high precision linear motor driven stage.
- Loader can be compatible with SMIF as an optional extra.
Specifications
| Substrate Size | 6025 |
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| Light Source | Argon Ion Laser |
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| Measurement Accuracy | 0.5nm |
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