EUV Mask Backside Inspection and Cleaning System

BASIC Series

BASIC Series

Integrated solution for detection, height measurement and cleaning of particles on the backside of EUV masks

Topics

Features

  • Inspection optics optimized for detection of particles on the backside of EUV masks
  • Measurement of the height of killer particles
  • Cleaning function for removal of killer particles
  • Dual pod handling system with no particle adders
  • Scanning system that causes no damage on pattern surface
  • Inspection time conforming to the requirement of EUV lithography in production
  • Automated inspection linked with overhead hoist transport
  • Compact and all-in-one design including power supply and control unit

Applications

  • Incoming and periodic inspection of EUV masks at wafer fabs
  • Detection, height measurement, and cleaning of particles on the backside of EUV masks
  • Outgoing inspection by EUV mask shops and mask blank manufacturers

Specifications

Dimensions 1,550 (W) x 2,955 (D) x 2,400 (H)
Applicable mask EUV masks (6 inch)
Note Lasertec can offer a best mix of inspection, measurement and cleaning functions of the BASIC Series for your specific needs. Please contact us for more information.

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