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EUVL Mask Substrates/Blanks Inspection SystemMAGICS Series M7360
An EUVL Mask Substrates / Blanks Inspection System Jointly Developed with SEMATECH
- Basic Information
Features
- High Sensitivity, High Resolution, High Contrast and nearly Flare Free
- High throughput
- Free from influences by haze or color shades and inspection is possible on all kinds of substrates in the mask blanks production processes
- High resolution defect review by confocal optics
- Dust free marking by diamond chip
Applications
- Particle inspection of Mask Substrates and Mask Blanks for EUVL
- Review and measurement of defects (particles)
Specifications
| Wavelength of inspection light | 266nm |
|---|---|
| Detection sensitivity | 30nm |
| Throughput | 1 hour / substrate |
| Mask size | 6025 |
- Basic Information
Terms related to this series
Please feel free to contact us by sending us a request from below or by calling us at the phone number on the right.
