Please feel free to contact us by sending us a request from below or by calling us at the phone number on the right.
ArF Mask Review StationMRS193EX
Defect review by the same wavelength as exposure wavelength
- Basic Information
Features
- Mask defect review system most suited for defect observation after defect inspection in the Photomask manufacturing procedure
- Powerful tool for review of mask patterns and defects of 100nm and smaller because of higher resolution implemented by employing a light source of shorter wavelength.
- Masks with pellicle mounted are observable.
- Defects can be observed very easily based on coordinate data sent from inspection tools due to the employment of a high precision stage.
- Defect highlight display is available after automatically detecting the defective area within the viewing field.
- Tool platform is common with that of MPM193EX and a function for measuring phase difference/transmittance can be added as an option.
- 3D measurement becomes available by installing an AFM as an option.
- Linkage with simulation software for defect transferability is available (Option)
Applications
- Mask defect review after defect inspection
- Defect size measurement
- Verification assistance for particles (cleanable) and pattern defects (need to be repaired)
- Measurement of phase shift and transmittance (option)
Specifications
| Light Source | 193 nm Excimer Laser |
|---|---|
| Coordinate resolution of stage | 0.1µm |
| Coordinate accuracy of stage | 2µm or less |
| Substrate size | 6025 |
| Viewing field size | 64µm×51µm 16µm×13µm(4× zoom image) |
- Basic Information
Please feel free to contact us by sending us a request from below or by calling us at the phone number on the right.
Phase shift and transmittance of Phtomask become measurable after cleaning and pellicle mounting
A de facto standard phase-shift measurement system for ArF wavelength
Photomask inspection system for semiconductor devices at 45nm node and beyond
