1. Best suited for thickness measurement of SiO2 film and photoresist layer on Si or glass substrates.
2. Each thickness of bilayer with different refractive indexes is measurable.
3. Film thickness can be measured without being influenced by reflected light from the glass substrate back surface and such by exploiting features of confocal optics.
4. Measuring point can be specified from 1 pixel to arbitrary area (averaged film thickness in this case) on the confocal image of very high resolution.
5. Accurate thickness measurement in the range from 50 nm up to 1 um can be performed.
   When the Z cross section mode equipped as a standard function for measurement above 1 um is additionally used, the thickness measurement range can be as wide as from nano scale to milli scale.(*Thickness measurement range depends on refractive indexes.)

After acquiring the reflectivity of the sample from the above mentioned image for each wavelength, thichness is obtained by the curve fitting method by using the aforementioned reflectivity.