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2002

2002.11.01: International Sematech and we launch joint development of EUVL Mask Substrate / blank inspection system

2002.07.01: Defect inspection system for incoming inspection of mask blanks and for process evaluation of mask manufacturing Maskblanks Inspection System"M2350"

2002.06.01: The first mask blanks inspection applicable to a 0.07?m or finer design rule in the industry EUVL Mask Substrates/Blanks Inspection System "M1350"

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