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New Product
2002
- Jul 1, 2002
- Defect inspection system for incoming inspection of mask blanks and for process evaluation of mask manufacturing Maskblanks Inspection System"M2350"
- Lasertec joined the blanks inspection market two years ago, and has established the MAGICS series mask substrates/blanks inspection system M1320 as a leading inspection model in the mask substrates/blanks industry. Now, as a sister model of the model M1320, Lasertec introduces a new Maskblanks Inspection System M2350 that is optimized for incoming inspection of maskblanks at a mask shop and for process evaluation of mask manufacturing, and starts to receive orders.
* "MAGICS" is an abbreviation for Multiple image Acquisition for Giga-bit Inspection with Confocal System.
* Mask substrates are glass substrates before maskblanks are made.
* Maskblanks are substrates for photomask production before patterning
- Jun 1, 2002
- The first mask blanks inspection applicable to a 0.07?m or finer design rule in the industry EUVL Mask Substrates/Blanks Inspection System "M1350"
- As a sister model of the industrial standard Mask Substrates/Blanks Inspection System M1320, which is typically called "MAGICS", Lasertec introduces a new product "EUVL Mask Substrates/Blanks Inspection System M1350" that supports the EUVL technology employed in semiconductor devices with a 0.07?m or finer design rule, and will start to accept orders on June 1.
* "MAGICS" is an abbreviation for Multiple image Acquisition for Giga-bit Inspection with Confocal System.
* Mask substrates are glass substrates before mask blanks are made.
* Mask blanks are substrates before patterning for Photomask production.
* EUVL is an abbreviation for Extreme Ultra Violet Lithography.
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