An EUVL Mask Substrates / Blanks Inspection System M7360

Lasertec has been working on a Joint Development Program with SEMATECH* 1) in USA regarding a Mask Substrates* 2) / Blanks* 3) Inspection System for EUVL since 2002. Just recently, this Joint Development Program has been successfully concluded and Lasertec starts to commercialize the Mask Substrates* 2) / Blanks* 3) Inspection System M7360 for EUVL that is the development result of the Joint Development Program. EUVL is the technology that is regarded as the most promising technology as the next generation lithography and realization of its practical utilization is most strongly desired. In fact, it is widely believed that the EUVL technology will be applied to devices of 32nm Half Pitch node and further. In EUVL, even ultra minute particles existing in the multi layer that constitutes reflective film on the mask surface would become killer defects. Thus, it is expected that M7360 capable of detecting even these ultra minute particles would remarkably contribute to quality betterment of mask blanks for EUVL. M7360 prides itself for its highest sensitivity in the product series "MAGICS"* 4) that has been popular in the lithography field as the Mask Substrates* 2) / Blanks* 3) inspection systems.


*1 "SEMATECH" headquartered in Texas USA is a consortium working on variety of developments of materials, processes and equipments technologies critical to the next generation semiconductor manufacturing.
*2 Mask substrates is a glass substrates before being made to mask blanks.
*3 Mask blank is a substrates for making photomasks before patterns are formed.
*4 "MAGICS" stands for Multiple image Acquisition for Giga-bit Pattern Inspection with Confocal System.

• High sensitivity, High resolution, High contrast and nearly Flare free
• This one system performs both inspection and review
• Free from influences by haze or color shades and inspection is possible on all kinds of substrates in the mask blanks production processes.
• High throughput

• Particle inspection of Mask Substrates and Blanks for EUVL
• Review and measurement of defects (particles)

Main body, Control rack, Rack for Laser Control , Operation desk

Please review product page for any further information.