The newest inspection/measurement systems for Photomasks and wafers will be introduced. Also, an actual model of a new 3CCD Real Color Confocal Microscope OPTELICS® H1200 of ultra high resolution/high scan rate will be exhibited. We sincerely hope that you could arrange your schedule to drop by our booth to actually see the newest performances and functions of these systems. We will be waiting for your kind visit to our booth.
Detailed information
| Session |
2008-01-30 17:40 ～ 2008-02-01 17:50 |
| Site |
COEX ATLANTIC HALL, SEOUL |
| Booth No. |
No.1636 |
| Products to be exhibited |
Wafer Inspection Review System,Photomask Inspection System,Pellicle/Photomask Particle Inspection System,Mask Blanks Inspection System,EUVL Mask Substrates / Blanks Inspection System,Phase shift Measurement System, |
Product detail
