Lasertec has commercialized a new maskblanks defect inspection system "M3320" for high sensitivity in-line defect inspection compatible with semiconductor devices of 90nm, and has started to accept order for this new product on March 17th.
"M3320" is a successor system to the conventional system "M1320" that is one of the Lasertec "MAGICS" series systems. "M3320" keeps the same level of high throughput as that of the conventional system and simultaneously achieves a remarkable improvement in defect inspection sensitivity.
* "MAGICS" is an abbreviation for Multiple image Acquisition for Giga-bit Inspection with Confocal System.
* Maskblanks is the substrate for photomask production before patterns are formed on the substrate.
Description
Lasertec commercialized a maskblanks inspection system "M1320" in March 2000 and this system has been received well by many customers. At the same time, demand for higher quality of photomask has intensified due to miniaturization of device design rule in recent years and demand for an inspection system with higher defect detection sensitivity is becoming ever stronger.
In order to satisfy such strong demand by customers, Lasertec has commercialized "M3320" that accomplishes the high defect detection sensitivity of 100nm while keeping the throughput as high as has been performed by the conventional systems.
Features
- The first inspection system in the industry for in-line inspection compatible with maskblanks for 90nm node semiconductor devices.
- Has achieved overwhelmingly high sensitivity of 100nm by improving optics and circuitry for defect signal, while keeping the throughput as high as that of the conventional system.
- Defect inspection of the substrate surface is possible, completely eliminating the effect of the reflection at the back surface of the substrate.
- 3D feature size observation is available based on the laser confocal optics
- Automatic determination whether the detected defect is a scratch or a foreign particle
- Applicable to wide range of processes from glass substrate to resist processes
- Maximum of 5 cassettes can be mountable and its configuration is flexibly settable.
- High operability
Technical Features
- High scanning rate with 33 multi beams
- Employment of laser confocal optics that realizes high resolution without flare, and high S/N ratio
- Utilization of a high power Argon Ion Laser as the light source
- Have achieved the maximum image processing speed of 3.1 billion pixels per second by simultaneously driving a 31 channel high speed image processing circuitry
Applications
Inspection of Mask Blanks
- Quite effective inspection is possible for all kinds of surfaces such as glass substrate, chromium film, halftone film, resist film and so on.
- In the laser confocal optics, in particular, the defect inspection sensitivity does not depend on the reflectivity of substrates and inspection with high sensitivity is possible for shallow scratches on glass surface, halftone film surface and so on, accordingly.
- This system is indispensable for technical development because review function qualities are high and 3D feature observation of defect is possible.
Configuration
Main body and control unit
