Lasertec has completed renewal of Middle/Large Photomask Inspection Systems, 34MD/44MD series, which inspect defects on the original plates used for production of LCD panels. As a result, we have commercialized a new product series [Middle/Large Photomask Inspection Systems, LI34 / LI44 ] that is capable of inspecting, in addition to Photomasks for LCD, Photomasks for printed-circuit boards and Bump Masks by equipping the Data Base function that is compatible with various CAD data formats based on the new digital signal processing circuits.
Lasertec will start to accept orders on October 1st, 2006.
This new series competes the product lineup for Middle/Large Photomask Inspection Systems compatible with Die to Database mode, including our anchor product Large Size Photomask Inspection System, 51MD, which enable us to satisfy all kinds of Photomask Inscpection needs from Photomasks for LCD to Photomasks for Printed-Circuit Boards and Bump Masks.
Background
Photomasks for LCD is becoming larger as ever for improving productivity for TV panels and at the same time, patterns of these masks are becoming more and more complicated. In the area of middle to large size photomasks for Printed-Circuit Boards and Bum Masks, patterns are becoming complex and demand for resolution is becoming higher and higher, for example in LTPS*1) , accordingly. Also, in the field of Photomasks for Printed-Circuit Boards and Bump Masks, higher quality is being demanded along with progress of higher resolution technologies. For the production of the photomasks thus far mentioned, such inspection systems that inspect photomasks with high speed and at the same time with high sensitivity are becoming a must. Lasertec decided to complete renewal of the conventional inspection systems 34MD/44MD in order to satisfy the diversified market needs in recent years. In addition to digitization of the inspection circuit for making the inspection circuit more flexible by replacing the conventional analogue signal processing technology with the most advanced digital signal processing, we have developed a Database inspection function that is compatible with various data formats such as DXF, Gerber, GDS and so on, in order to satisfy inspection needs of various kinds of photomasks. We now release the new products LI34 / LI44 equipped with these new technologies.
*1 Low Temperature Poly-Silicon
Features
- Digitization of the inspection circuits such as ALL DET, EDGE DET and CELL SHIFT has made it possible for all these inspection circuits (modes) to be compatible with various patterns on masks.
- In addition to the standard inspection format MEBES, the system is compatible with various CAD formats such as DXF, Gerber and GDS by option.
- Die to Die and Die to Database are equipped as standard modes.
- Compatible with various mask sizes;
LI44 300mm×300mm～1200mm×1100mmA LI34 300mm×300mm～900mm×900mm - Reduced foreign particle adherence to masks by holding a mask vertically under air down flow from the top of the system.
- Selective setting of two lenses out of the three standard lenses that are 5X, 10X and 20X optimizes the system sensitivity and inspection throughput.
- Realized user-friendly operability
- A clean unit (FFU) as a standard equipment
- Small footprint realized by design pursuing compactness
LI44 W:3410 mm / D:1050 mm LI34 W:2680 mm / D:1015 mm
Applications
- Inspection of photomasks for LCD's
- Inspection of photomasks for printed circuit boards
- Inspection of bump masks
Configuration
Main body, Rack for inspection circuit, Operation rack
