LCD Large Photomask In-process Repair System "LR 51"

Photomasks are always required to have a very high quality due to its nature of being the original plate for device circuit patterns and also yield improvement is an imperative task at all times. With regard to repair quality, not only repair dimension precision and adhesiveness of repair materials, but also damage and contamination generated by laser repair process, and light shield film characteristics, are all required to show very high quality. Lasertec has commercialized a LCD Large Photomask In-process Repair System "LR51" in order to satisfy such requirements for higher quality of large size photomasks, as is described above. This system has capability to repair miniscule defects with high quality with a combination of a laser repair unit and a high precision dispenser that can dispense a very small amount of repair material solution. Please be noted that this high precision dispense technology is realized by the technical cooperation with Hyper Photon System Corporation.

• White defects and black defects after exposure and development of mask resist patterns can be repaired. Because repair can be conducted in the state of resist patterns, damages and contamination on glass by laser irradiation do not occur and furthermore, layer structure (CrO/Cr) of shielding part can be maintained, which provide high quality repair, compared with the conventional repair method that is performed after etching.
• A mechanism that protects repair region by cover film is equipped and contamination of mask by debris that is generated during laser repair can be prevented.
• Masks as large as 1500mm x 1300mm maximum can be processed.

• Repair of white defects and black defects in large size Photomask manufacturing process

Main body, Controller PC, Control box

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