Lasertec has commercialized newest model of Mask Blanks Inspection Systems [M6640] and [M6641] that achieve both High Throughput and High Sensitivity simultaneously.
Description
Lasertec has commercialized new products, "Mask Blanks Inspection Systems [M6640] and [M6641]" that are compatible with photomasks used for the most advanced semiconductors with design rule of 65nm and further.
[M6640] and [M6641] possess sensitivity as high as that of our Mask Blanks inspection system M1350 for EUVL and, at the same time, the new systems have achieved throughput high enough to be applicable to outgoing or incoming inspection of mask blanks at mass production facilities.
System formation of [M6640], in particular, is best suited to outgoing inspection at mask blanks suppliers, because of loader ability to mount five cassettes maximum. [M6641] consists of loader formation of two ports for RSP cassettes and one port for open cassette as a standard arrangement, which is best suited to mask makers for their incoming inspection of mask blanks in addition to application of the system to process and equipment monitoring. [M6641] is equipped with DENSE SCAN MODE (higher sensitivity inspection becomes available), which makes it possible to inspect Line & Space monitor patterns.
We have already received multiple purchase orders for these systems
Features
- Most advanced Mask Blanks Inspection Systems that simultaneously achieve high sensitivity effective for inspection of the next generation high quality mask blanks and high throughput best suited to incoming and outgoing inspection at mass production facilities
- Based on the key technology of MAGICS that has already become a de facto standard in the industry, the new systems are equipped with light weight / low gravity point stage with halved acceleration and deceleration speed, and newly developed optics of 63 multi beams.
- M6641 possesses capability to inspect monitor patterns of Line & Space by selecting DENSE SCAN MODE (higher sensitivity inspection)
- High resolution defect review by confocal optics
- High sensitivity inspection of variety of substrates, from glass substrates to all kinds of substrates in the production process of mask blanks because of minimized effect from haze and color shading
- Dust-free marking by diamond chip is available.
- Up to 5 cassettes can be mounted and formation of these cassettes can be arranged flexibly.
Applications
- Inspection of Quartz Substrates, Chromium Layer, Halftone Layer, Mask Blanks with resist coating
- Defect review and measurement
Configuration
Main body, Controller PC, Control box
* "MAGICS" is the abbreviation of Multiple image Acquisition for Giga-bit Pattern Inspection with Confocal System.
* Substrate is a glass plate before making Mask Blank.
* Mask Blank is a substrate for Photomask production before patterns are formed.
