Patterned Wafer Warpage/Stress Inspection System "WASAVI Series SK300"

Lasertec has commercialized a new product, "Patterned Wafer Warpage/Stress Inspection System: WASAVI Series SK300" that is compatible with patterned wafers for 45 nm design rule and further.

Today, in response to further advancement toward finer patterns and introduction of new materials and new processes, quality requirements for films at each process are becoming more and more demanding. Technical management of stress in films, one of the film qualities, is now a very important task. The SK300 system announced here by Lasertec Corporation inspects stress all over patterned wafer stress, and stress values and their distribution can be measured with high accuracy and high-speed, accordingly.

Application of SK300 to development stages of wafer process and to start-up of new wafer lines will provide findings of problems and optimization of process at an early stage of development or start-up of wafer processes through enough understanding of in-plane status of patterned wafers. Also, when SK300 is applied to production line, hotspot (in-plane non-uniformity spot) originating to process instability would be detected, a root cause of unexpected trouble would be easily investigated, and wafer crack or wafer handling error originating to warpage/stress of wafer would be effectively prevented from occurring. These wide varieties of SK300 application would realize improvement of utilization rate of process equipments and process yields.

SK300 provides stable inspection from development stage to production stage of wafer process, based on the combination of optimized optics and a unique high-speed and high-accuracy stage.

• Compatible with wafers of most advanced fine patterns such as 45 nm and further
• Automatic inspection of films of different reflectivity and quality without optical adjustment
• Realization of high inspection ability including high-speed inspection makes this system compatible with production line.
• Utilization of flexible and high-reliability optical unit that is not based on light interference principle
• Easy to use and well-developed display function

• Stress inspection of stress liner film used for strain engineering technology
• Analyses of the most advanced processes such as High-k, Metal Gate, Porous Low-k and such
• Management of processes that go through large thermal stress such as millisecond anneal
• The others such as stress analysis at the time of new material or new process introduction

Main body, Controller PC, Control box

Please review product page for any further information.