Lasertec Corporation today simultaneously announces two new products [Phase Shift / Transmittance Measurement System MPM193EX] and [ArF Mask Review Station MRS193EX]
Description
In the most advanced semiconductor production processes that seek finer and finer resolution, photomasks used in such production processes require review and repair of finer defects and the usage rate of phase shift mask becomes higher and higher. In view of such circumstance, Lasertec has been developing and selling inspection systems as a top maker of phase shift measurement systems and defect review stations for photomasks .
Lasertec has now completed the development of two new systems by building up the two models on a new and unified design platform, which makes the developed models exceed well over the conventional models, and the resulting newly developed two systems are announced here.
For the phase shift / transmittance measurement system MPM193EX, compared with the conventional MPM193 that is a de facto standard in the industry, the light source is changed from a deuterium lamp to an ArF excimer laser and measurement repeatability has been improved from twofold to fivefold. Also, the system satisfies customer demand that phase shift and transmittance are to be measured in a smaller area. Furthermore, it becomes possible to guarantee phase shift and transmittance values at outgoing inspection by measurement of photomasks right before shipment after cleaning and pellicle mounting of photomasks.
The wavelength of the ArF mask review station MRS193 EX has been changed to shorter wavelength of 193 nm from 248 nm that was used in the former model MRS248. While variety of functions for analyses available in MRS 248 is unchanged, resolution is improved and defect review, CD measurement and such can be performed with the same wavelength as the exposure wavelength.
By unifying the platform of MPM193EX and MRS193EX, it has become possible to add a defect review function to the phase shift measurement system MPM193EX and a phase shift measurement function to the mask review station MRS193EX. For this reason, it has become possible to satisfy the demands both for phase shift / transmittance measurement and the defect review function by one system at the production line in which two independent systems have been necessary.
Features
- Measurement performance is remarkably improved.
- Measurement of masks with pellicle mounted is possible.
- Automatic inspection function is greatly improved compared with that of the conventional model
- Phase shift measurement in the micro area of 1 μm or less is now possible.
- Auto loader and mini-environment with chemical filters are standard equipments.
- The system is built up on a unified platform with MRS193EX and mask review function can be added as option, accordingly.
Applications
- Phase shift measurement of phase shift masks
- Transmittance measurement of half tone phase shift mask
- Defect review of masks (Option)
Configuration
Main Body, Control Section, Computer Section
Features
- Mask Defect Review System most suited for defect observation after defect inspection in Photomask production
- Implementation of higher resolution by employment of shorter wavelength reinforces review ability of mask patterns and defects smaller than 100 nm.
- Masks with pellicle mounted can be observed.
- Employment of high precision stage makes defect observation easy based on the coordinate data from defect inspection systems.
- Defect area in the viewing field is automatically detected and provides highlight display of defects.
- The system is built up on a unified platform with MPM193EX and phase shift / transmittance measurement function can be added as an option, accordingly.
- 3D measurement becomes available by installing an AFM within the system. (Option)
- Defect transfer simulation software can be linked to the system. (Option)
Applications
- Mask defect review after defect inspection
- Defect size measurement
- Verification of foreign particles (cleanable) and pattern defects (repair needed)
- Phase shift / Transmittance measurements (Option)
Configuration
Main Body, Control Section, Computer Section
