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2006

Nov 1, 2006

Exhibits at [SEMICON JAPAN 2006]

[SEMICON JAPAN 2006] was held for three days from December 6th (Wed.) to 8th (Fri.) and our booth was very well attended all through those three days thanks to your kind support. We deeply thank here all customers who were kind enough to drop by our booth.

Detailed information

Session 2006-12-06 18:30 ~ 2006-12-08 18:30
Site Makuhari Messe, Chiba
Booth No. No.1B-301
Booth map
Products to be exhibited Wafer Inspection Review System,Photomask Inspection System,Mask Blanks Inspection System,Mask Process Monitoring System,Phase shift Measurement System,DUV Mask Review Station,Pellicle/Photomask Particle Inspection System,Five Line Confocal Microscope

Product detail

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