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2013
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2013

2013.02.22: New Product: "BASIC Series" EUV Mask Backside Inspection and Cleaning System

2012

2012.11.14: New Product: Lithography Process Inspection System WASAVI Series "LX330"

2012.11.13: New Product: Mask Inspection System MATRICS X810 Series

2012.10.25: New Product: Photomask Inspection System MATRICS X700HiT Series

2012.10.23: New Product : Lasertec Announces ECCS B310 New Electro-Chemical Reaction Visualizing Confocal System

2012.10.23: New Product : Lasertec Announces TSS20 Coating Thickness Scanning System

2012.08.27: New Product: WASAVI series "BGM300" TSV Back Grinding Process Measurement System

2012.08.01: New Product: CLIOS G821: a large-size photomask inspection system for high-definition LCDs

2012.04.10: New Product: A Mask Blanks Inspection System MAGICS Series"M6610"

2012.04.10: New Product: Mask Blanks Inspection Systems MAGICS Series"M6640S/M6641S"

2011

2011.11.29: New Product: TSV Etching Depth and Profile Measurement System "WASAVI Series TSV300S"

2011.11.21: New Product: Transparent Object Inspection System WASAVI Series "TROIS33"

2011.11.17: New Product: Solar Cell Spectral Response Distribution Measurement System MAP Series "SR-MAP"

2011.11.11: New Product: SiC Wafer Inspection/Review System WASAVI Series "SICA6X"

2010

2010.11.25: New Product: Lithography Process Inspection System WASAVI Series "LP300"

2010.11.04: New Product: Transparent Object Inspection System WASAVI Series "TROIS32"

2009

2009.12.01: New Product: SiC Wafer Inspection/Review System WASAVI Series "SICA61"

2009.11.26: New Product: PC Parts Warpage/3D Profile Inspection System [PSK380]

2009.11.12: New Product: Haze Removal System PROMAHAZE

2009.09.17: New Product: Desktop Type PV Cell Efficiency Distribution Measurement System MAP Series "MP15"

2009.09.10: New Product: Photomask Inspection System MATRICS X700 Series

2009.05.21: Visualization of PV Cell Conversion Efficiency Distribution Development and Commercialization of a New Product [PV Cell Conversion Efficiency Distribution Measurement System MP50]

2008

2008.11.20: MURA/CD Error High Resolution Visualizing System [WASAVI Series MR300]

2008.11.14: Wafer Inspection / Review System M5640

2008.09.26: Integrated System (OPTELICS SH1200) comprised of Confocal Microscope and Scanning Electron Microscope implements seamless observation from nm through mm range

2008.04.09: Large Size Photomask Substrates / Blanks Inspection System "LB79"

2008.04.09: LCD/TFT•Color Filter Repair System"RAGNAS series"

2008.03.26: Large Mask Inspection System LI712

2008.03.26: A Pellicle Inspection and Pellicle Mounting System for LI712 "71PA/71PP"

2008.02.19: Phase Shift / Transmittance Measurement System MPM193EX and ArF Mask Review Station MRS 193EX

2007

2007.11.29: Wide Variety of Optional Functions (WIDE) Substantially Expand Performance of 3CCD Real Color Confocal Microscope "OPTELICS H1200"

2007.11.27: TSV Etching Depth Inspection System "WASAVI Series TSV300"

2007.11.20: Patterned Wafer Warpage/Stress Inspection System "WASAVI Series SK300"

2007.09.18: Mask Blanks Inspection Systems [M6640] / [M6641]

2007.09.11: 3CCD Real Color Confocal Microscope OPTELICS H1200

2007.02.23: For Color Film Repair "CR Series CR-IC"

2006

2006.11.22: Photomask Inspection Systems "MATRICS Series"

2006.10.31: An EUVL Mask Substrates / Blanks Inspection System M7360

2006.09.25: A pellicle inspection and pellicle mounting system for 51MD "51PA"

2006.09.25: Middle/Large Photomask Inspection Systems "LI34 / LI44"

2005

2005.11.25: Pellicle/Photomask Particle Inspection System "PEGSIS P100"

2005.09.01: Five Line Confocal Microscope "OPTELICSR S130"

2005.04.01: CF/TFT Repair System "CR Series" Compatible with 7/8th Generation LCD Mother Glass

2005.03.17: Maskblanks Inspection System"M3320"

2004

2004.04.13: DUV Mask Review Station "MRS248"

2004.04.08: Mask Contamination Monitoring System "MCM400"

2003

2003.11.20: Real Color Confocal Microscope "OPTELICSR C130"

2003.11.18: Wafer Inspection/Review System "M350H" Sales Release

2003.11.18: Mask Process Monitoring System "M2351" Sales Release

2002

2002.07.01: Defect inspection system for incoming inspection of mask blanks and for process evaluation of mask manufacturing Maskblanks Inspection System"M2350"

2002.06.01: The first mask blanks inspection applicable to a 0.07?m or finer design rule in the industry EUVL Mask Substrates/Blanks Inspection System "M1350"

2001

2001.04.01: Photomask / Reticle Inspection System "MD3000"

2001.01.15: Confocal Scanning Microscope "HD100"

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