ForYear

• 2010
• 2009
• 2008
• 2007
• 2006
• 2005
• 2004
• 2003
• 2002
• 2001
  • Phase Shift Mask Measurement System for F2 Lithography "MPM157"
  • Consolidated Financial Review for the Year Ended June 30, 2001
  • Photomask / Reticle Inspection System "MD3000"
  • Confocal Scanning Microscope "HD100"

ForCategory

• New Product
• Event
• Indication Information
• Business Result Summaries
• etc.

• 
  • 12 million pixels images
  • Newly Developed Optics
  • High-Speed Processing
  • Simple Operation
  • WIDE Functions
  • New measurement functions

• Production process of semiconductor and LCD TV

• Inquiry(General)
• Inquiry(Products)
• Brochure Request
• Consultation about Inspection and Measurement
• Inquiry Window