ForYear

• 2010
• 2009
• 2008
• 2007
• 2006
• 2005
• 2004
• 2003
• 2002
  • International Sematech and we launch joint development of EUVL Mask Substrate / blank inspection system
  • Consolidated Financial Review for the Year Ended June 30, 2002
  • Defect inspection system for incoming inspection of mask blanks and for process evaluation of mask manufacturing Maskblanks Inspection System"M2350"
  • The first mask blanks inspection applicable to a 0.07?m or finer design rule in the industry EUVL Mask Substrates/Blanks Inspection System "M1350"
  • Consolidated Financial Review for the Six Months Ended December 31, 2001
• 2001

ForCategory

• New Product
• Event
• Indication Information
• Business Result Summaries
• etc.

• 
  • 12 million pixels images
  • Newly Developed Optics
  • High-Speed Processing
  • Simple Operation
  • WIDE Functions
  • New measurement functions

• Production process of semiconductor and LCD TV

• Inquiry(General)
• Inquiry(Products)
• Brochure Request
• Consultation about Inspection and Measurement
• Inquiry Window