FPD Mask Blanks Inspection System
LBIS Series L852/L1052
Major performance upgrade for enabling yield improvement in high-definition FPD photomask production
Topics
Features
- New high-power laser light scattering optical system for high sensitivity and high throughput inspection
- Reflected-light differential interference contrast (DIC) optics and transmitted-light optics for high magnification defect review
- New software for automated defect review and classification
- Up to G8/G10-size mask blanks supported
- Compatible with various assist arms
Applications
- Outgoing or incoming inspection and review of quartz substrates (after cleaning or polishing)
- Defect inspection and review after chromium or chromium oxide deposition
- Defect inspection and review after resist coating
Specifications
| Detection sensitivity | 0.3um (PSL on quartz substrate) |
|---|---|
| Inspection time | 20 minutes per substrate (G8) |
| Review method | Reflected light DIC and transmitted light (concurrent) |
