B

Confocal System for In-Situ Observation/Measurement of Electro-Chemical Reactions inside Lithium Ion Batteries
ECCS B320

Wafer Bump Inspection and Measurement system
BIM300

TSV Back Grinding Process Measurement System
BGM300

EUV Mask Backside Inspection and Cleaning System
BASIC Series

E

Wafer Edge Inspection System
EZ300

EUV Mask Blanks Inspection and Review System
ABICS E120

G

GaN Wafer Inspection and Review System
GALOIS Series

FPD Photomask Inspection System
CLIOS G10 Series

FPD Photomask Inspection System
CLIOS G8Series

H

Laser Microscope
OPTELICS® HYBRID

L

Lithography Process Inspection System
LX530

Lithography Process Inspection System
LX330

FPD Mask Blanks Inspection System
LBIS Series L852/L1052

M

MURA/Film Inspection System
MR300

Wafer Inspection and Review System
MAGICS Series M5640

Mask Blanks Inspection and Review System
MAGICS Series M8650/M8651

Mask Blanks Inspection and Review System
MAGICS Series M8350/M8351

Mask Blanks Inspection and Review System
MAGICS Series M6640S/M6641S

Phase-Shift and Transmittance Measurement System
MPM193EX

Phase-Shift Measurement System
MPM248

Phase Shift Measurement System
MPM365gh

P

Pellicle Inspection and Pellicle Mounting System for CLIOS
71PA CM

Pellicle Inspection and Pellicle Mounting System for CLIOS
51PA CM

S

SiC Wafer Inspection and Review System
SICA88

SiC Wafer Inspection and Review System
SICA6X

T

Coating Thickness Scanning System
TSS20

Transparent Object Inspection and Review System
TROIS33

Transparent Object Inspection and Review System
TROIS32

V

In-Situ Observation at Ultra High Temperature Confocal Scanning Laser Microscope
VL2000DX-SVF17SP

X

Mask Inspection System
MATRICS X8ULTRA Series

Mask Inspection System
MATRICS X810EX Series

Mask Inspection System
MATRICS X810 Series

Photomask Inspection System
MATRICS X700HiT Series

Photomask Inspection System
MATRICS X700 Series

1

EUV Mask Blanks Inspection and Review System
ABICS E120

Phase-Shift and Transmittance Measurement System
MPM193EX

FPD Photomask Inspection System
CLIOS G10 Series

FPD Mask Blanks Inspection System
LBIS Series L852/L1052

2

Coating Thickness Scanning System
TSS20

In-Situ Observation at Ultra High Temperature Confocal Scanning Laser Microscope
VL2000DX-SVF17SP

Phase-Shift Measurement System
MPM248

3

Confocal System for In-Situ Observation/Measurement of Electro-Chemical Reactions inside Lithium Ion Batteries
ECCS B320

Wafer Edge Inspection System
EZ300

Wafer Bump Inspection and Measurement system
BIM300

TSV Back Grinding Process Measurement System
BGM300

Lithography Process Inspection System
LX330

MURA/Film Inspection System
MR300

Transparent Object Inspection and Review System
TROIS33

Transparent Object Inspection and Review System
TROIS32

Phase Shift Measurement System
MPM365gh

5

Lithography Process Inspection System
LX530

Wafer Inspection and Review System
MAGICS Series M5640

Pellicle Inspection and Pellicle Mounting System for CLIOS
51PA CM

6

Mask Blanks Inspection and Review System
MAGICS Series M6640S/M6641S

SiC Wafer Inspection and Review System
SICA6X

7

Photomask Inspection System
MATRICS X700HiT Series

Photomask Inspection System
MATRICS X700 Series

Pellicle Inspection and Pellicle Mounting System for CLIOS
71PA CM

8

Mask Inspection System
MATRICS X8ULTRA Series

Mask Inspection System
MATRICS X810EX Series

Mask Inspection System
MATRICS X810 Series

Mask Blanks Inspection and Review System
MAGICS Series M8650/M8651

Mask Blanks Inspection and Review System
MAGICS Series M8350/M8351

FPD Photomask Inspection System
CLIOS G8Series

FPD Mask Blanks Inspection System
LBIS Series L852/L1052