Mask Blanks Inspection and Review System

MAGICS Series M8650/M8651

MAGICS Series M8650/M8651

Mask blank inspection system designed for 7 nm technology node and beyond

Topics

Features

  • Latest line of advanced inspection systems attaining high sensitivity for the next-generation mask blank inspection and offering high throughput for outgoing and incoming inspection at production facilities.
  • 63-beam scanning confocal optics based on the core technology of MAGICS, a de facto standard tool, combined with special small defect detection circuitry.
  • Significantly higher sensitivity not only for defects on substrates but also for defects on each layer of advanced semiconductor mask blanks, enabling the more stringent qualification of high-quality blanks.
  • Compatibility with multi-slot cassettes for blank manufacturers, with RSP and MRP for mask shops, and with dual pods for EUVL.
  • M8651 meets the requirement of line & space monitor pattern inspection and is effective for various process controls at mask shops.

Applications

  • Inspection of substrates, optical mask blanks (Cr, MoSi, half-tone) and EUV mask blanks (Mo/Si multilayer, absorber)
  • Defect reviews

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