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| 1960 |
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Commenced operations with the development of an X-ray television by the R & D facility for ITV. |
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| 1962 |
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Restructured operations established under the new name of NJS Corporation.
Developed X-ray televisions and branched out into new fields. |
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| 1971 |
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Introduced a tension analyzer-the first product to be marketed under the NJS brand name. |
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| 1975 |
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Developed a Photomask pinhole inspection system.
Received the "Hatsumei Taisho" invention award for an Autofocus microscope from the Japan Association of Inventors and Nikkan Kogyo Shimbun. |
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| 1976 |
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Developed a LSI photomask inspection system. |
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| 1977 |
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Received "Best Top-Ten New Products Award" for the LSI photomask inspection system from Nikkan Kogyo Shimbun. |
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| 1980 |
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Received the "Okochi Kinen Gijutsu Award." |
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| 1982 |
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Received "Best Top-Ten New Products Award" once again for the LSI reticle inspection system.
Nominated as a small-to-medium-sized enterprise rationalization model company. |
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| 1985 |
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Received the "Kagaku Gijutsucho Chokan Award" for the reticle inspection system.
Inauguration of Lasertec Europe Branch. |
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| 1986 |
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Developed a Color scanning laser microscope.
Company name changed from NJS to LASERTEC.
Established LASERTEC U.S.A. Inc. in San Jose, California, U.S.A. |
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| 1988 |
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Received the "Kanagawa High Tech, Grand Prix" award for the color scanning laser microscope. |
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| 1990 |
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Registered with the Securities Dealer Association of Japan and initiated over-the-counter public offering of company stocks (Listing Code 6920). |
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| 1993 |
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Unveiled an Automatic LCD color filter inspection system and an automatic LCD color filter repair review-station. Developed a phase-shift measurement system. |
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| 1997 |
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Received the "Advanced Display of the year '97, Grand Prix" award for the LCD color filter inspection system. |
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| 1998 |
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Developed a wafer inspection system.(MAGICS series) |
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| 2000 |
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Developed a maskblanks inspection system.
Developed a APSM etching monitor. |
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| 2001 |
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Established LASERTEC KOREA Corp. in Seoul, Korea. |
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| 2002 |
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Lasertec corporate head office was ISO9001:2000 certified in 2002. |
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| 2006 |
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Developed a Photomask Inspection Systems (MATRICS series). |
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| 2007 |
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Developed a 3CCD Real Color Confocal Microscope (OPTELICS series H1200(WIDE)).
Developed a Patterned Wafer Warpage / Stress Inspection System WASAVI series SK300. |
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| 2009 |
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Developed a PV Cell Conversion Efficiency Distribution Measurement System MP50. |
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