Semiconductor Inspection Systems

TSV Back Grinding Process Measurement SystemWASAVI Series BGM300

Direct and speedy measurement of Si thickness, TSV depth and RST before and after TSV back grinding process

TSV Etching Depth and Profile Measurement System WASAVI Series TSV300S

Inspection system for depth, bottom surface shape and CD in TSV forming process

Lithography Process Inspection SystemWASAVI Series LX330

Macro inspection system for wafers at the 20nm node and beyond

MURA/Film Inspection SystemWASAVI Series MR300

High sensitivity inspection system for thickness/surface shape variation of wafer in its thinning process for BSI and of resist application and color filter/lens shape forming in image sensor manufacturing processes

Patterned Wafer Warpage/Stress Inspection SystemWASAVI Series SK300

High-speed warpage/Stress inspection for patterned wafers

Wafer Inspection/Review SystemMAGICS Series M5640

High sensitivity defect inspection/review system, implementing minute defect detection required by the next generation processes

Mask Inspection SystemMATRICS X810 Series

Mask inspection system for semiconductor devices at 20nm node and beyond

Photomask Inspection SystemMATRICS X700HiT Series

Photomask inspection system for semiconductor devices of 28nm node and further

Photomask Inspection SystemMATRICS X700 Series

Photomask inspection system for semiconductor devices at 45nm node and beyond

Photomask Inspection SystemMATRICS X600 Series

Photomask inspection system for semiconductor devices of 65nm node and further

Pellicle/Photomask Particle Inspection SystemPEGSIS P100

A high speed and high sensitivity particle inspection system compatible with photomasks for semiconductor devices with 90nm node and further

EUV Mask Backside Inspection and Cleaning SystemBASIC Series

Integrated solution for detection, height measurement and cleaning of particles on the backside of EUV masks

Maskblanks Inspection SystemsMAGICS Series M6640S/M6641S

Mask Blanks Inspection Systems that achieve both high sensitivity and high throughput simultaneously

Maskblanks Inspection SystemMAGICS Series M6610

Maskblanks Inspection System simultaneously achieving high sensitivity and high throughput

EUVL Mask Substrates/Blanks Inspection SystemMAGICS Series M7360

An EUVL Mask Substrates / Blanks Inspection System Jointly Developed with SEMATECH

Phase Shift/Transmittance Measurement SystemMPM193EX

Phase shift and transmittance of Phtomask become measurable after cleaning and pellicle mounting

Phase-Shift Measurement SystemMPM193

A de facto standard phase-shift measurement system for ArF wavelength

Phase-Shift Measurement SystemMPM248

A de facto standard phase-shift measurement system for KrF wavelength

ArF Mask Review StationMRS193EX

Defect review by the same wavelength as exposure wavelength

DUV Mask Review StationMRS248

Defect review with high resolution after defect inspection

PC Parts Warpage/3D Profile Inspection SystemPSK380

Measure PCB warpage and parts height in 3D with high-speed and