A Pellicle Inspection and Pellicle Mounting System for LI712 "71PA/71PP"


Lasertec has commercialized a new product: Pellicle*1 Inspection and Pellicle Mounting System [71PA/71PP], compatible with photomasks for the G10 LCD production process, and starts receiving orders on February 1st.

  1. *1Pellicle : A dust protective film that is mounted on a photomask


Photomasks for TFT LCD are always required to have high quality due to the fact that photomasks retain original circuit patterns of devices. Demands for better quality of photomasks are intensifying evermore and reduction of foreign particles is now an indispensable requirement. The new system announced here implements the whole process from inspection, tentative mounting through final mounting of pellicle when this system is in-line connected with LI712. Compared with the conventional process in which a Photomask is inspected by LI712 and transferred to a conventional pellicle- mounting tool, the new system offers a new process that would drastically reduce the risk of foreign particle adhesion on photomasks.
Please be reminded that this new system is a successor system to 51PA that has already been sold in the market and this new system is released as the one that is compatible with LI712 that is a Photomask inspection system for G10.

Key Features

  • This one system implements the whole process from inspection, tentative mounting through final mounting of a pellicle.
  • In-line connection with LI712 drastically reduces particle contamination of both masks and pellicles.
  • Installation of ionizers keeps clean environment by guarding against particle sticking and avoids productivity deterioration caused by re-mounting of pellicles.
  • Jigs for clamping a pellicle are stocked in arrangement by their sizes in a stocker and this system is compatible with pellicles of various sizes, accordingly.
  • Exfoliate paper can be peeled off automatically without giving excess stress by detecting tensile stress at a clamp when a pellicle is taken out of a carrying case of masks by a clamp.
  • In the pellicle mounting process, alignment procedure is available based on the measurement of distance between the mask edge and the pellicle edge by CCD cameras set at 4 places.
  • Automatic inspection of particles on pellicle, a review function, a particle-elimination function by air blow and a front-side / back-side inverting function implement high operability.
  • Because detected defects can be observed either in bright field or in dark field, and image data of particles can be stored, this tool is effective not only for good/no good verification but also for quality control and defect analysis.
  • After tentatively mounting pellicle on a mask, the mask is transferred to the final mounting tool. The final mounting tool is equipped with adsorption pads that work by air pressure bonding and are placed at a regular interval, and accordingly, the final pellicle mounting is performed with uniformity due to application of constant pressure and time for pressure bonding.


  • Automatic transportation and mounting of pellicle in the manufacturing process of large size photomasks.
  • Inspection of particles on pellicle by reflective scattering light (Quality confirmation inspection of pellicle)


Main body, Control rack, PC desk