Laser microscopes

Laser Microscope
OPTELICS® HYBRID

OPTELICS® HYBRID covers a full range of observation and measurement needs with 6 functions complementing each other.

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In-Situ Observation at Ultra High Temperature Confocal Scanning Laser Microscope
VL2000DX-SVF17SP

This microscope system is distributed by Yonekura Manufacturing Co., Ltd. Lasertec is the original equipment manufacturer (OEM) of the camera head furnished on this system.

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Systems for higher energy efficiency and better environment

Transparent Object Inspection and Review System
TROIS33

High sensitivity defect inspection/review system that inspects GaN on Si and transparent wafers at high speed

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Transparent Object Inspection and Review System
TROIS32

High Sensitivity Defect Inspection/Review System for inspection/analysis of various kinds of transparent wafers

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SiC Wafer Inspection And Review System
SICA88

Featuring both surface and photoluminescence (PL) inspection capabilities in one body

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SiC Wafer Inspection and Review System
SICA6X

An optimum system for outgoing/incoming inspections and process monitoring at SiC wafer production lines

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GaN Wafer Inspection and Review System
GALOIS Series

Detecting various GaN wafer defects faster and enabling high-resolution defect observation

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Coating Thickness Scanning System
TSS20

Innovative and effective tool for coating process management and quality improvement of LIB electrodes

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Confocal System for In-Situ Observation/Measurement of Electro-Chemical Reactions inside Lithium Ion Batteries
ECCS B320

In-situ visualization and measurement of electro-chemical reactions inside charging / discharging lithium ion batteries

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Semiconductor-related systems

Wafer Edge Inspection System
EZ300

For wafer edge yield management and process error analysis

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Wafer Bump Inspection and Measurement system
BIM300

For accurate 3D measurement of bump shapes and wafer periphery quality control

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TSV Back Grinding Process Measurement System
BGM300

Direct and speedy measurement of Si thickness, TSV depth and RST before and after TSV back grinding process

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Lithography Process Inspection System
LX530

High sensitivity CDU inspection for leading-edge devices

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Lithography Process Inspection System
LX330

For CDU control in leading-edge devices

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MURA/Film Inspection System
MR300

High sensitivity inspection system for thickness/surface shape variation of wafer in its thinning process for BSI and of resist application and color filter/lens shape forming in image sensor manufacturing processes

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Wafer Inspection and Review System
MAGICS Series M5640

High sensitivity defect inspection/review system, implementing minute defect detection required by the next generation processes

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Mask Inspection System
MATRICS X8ULTRA Series

EUV mask inspection system for 7nm and 5nm design node

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Mask Inspection System
MATRICS X810EX Series

Semiconductor mask inspection system for the 10nm and 7nm nodes

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Mask Inspection System
MATRICS X810 Series

Semiconductor photomask inspection system for the 14nm and 20nm nodes

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Photomask Inspection System
MATRICS X700HiT Series

Semiconductor photomask inspection system for the 28nm node

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Photomask Inspection System
MATRICS X700 Series

Semiconductor photomask inspection system for the 45nm node

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EUV Mask Blanks Inspection and Review System
ABICS E120

Detecting printable phase defects and enabling defect management for EUV mask blanks

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EUV Mask Backside Inspection and Cleaning System
BASIC Series

Integrated solution for detection, height measurement and cleaning of particles on the backside of EUV masks

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Mask Blanks Inspection and Review System
MAGICS Series M8650/M8651

Mask blank inspection system designed for 7 nm technology node and beyond

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Mask Blanks Inspection and Review System
MAGICS Series M8350/M8351

Mask blank inspection system for 10 nm technology node and beyond.

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Mask Blanks Inspection and Review System
MAGICS Series M6640S/M6641S

Mask blank inspection system that achieve both high sensitivity and high throughput simultaneously

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Phase-Shift and Transmittance Measurement System
MPM193EX

Phase shift and transmittance of Phtomask become measurable after cleaning and pellicle mounting

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Phase-Shift Measurement System
MPM248

A de facto standard phase-shift measurement system for KrF wavelength

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FPD-related systems

FPD Photomask Inspection System
CLIOS G10 Series

For high speed, high sensitivity inspection of Generation 10.5 FPD photomasks

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FPD Photomask Inspection System
CLIOS G8Series

High-sensitivity inspection that addresses the need of leading-edge FPD photomasks

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Pellicle Inspection and Pellicle Mounting System for CLIOS
71PA CM

Enabling automated pellicle inspection and mounting in combination with CLIOS for G10.5

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Pellicle Inspection and Pellicle Mounting System for CLIOS
51PA CM

Enabling the automated inspection and mouting of pellicles while linking with FPD photomask inspection system in the production line

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FPD Mask Blanks Inspection System
LBIS Series L852/L1052

Major performance upgrade for enabling yield improvement in high-definition FPD photomask production

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Phase Shift Measurement System
MPM365gh

Phase shift and transmittance measurement at g-line, h-line and i-line wavelengths

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