Actinic EUV Patterned Mask Inspection System

ACTIS A300 Series

ACTIS A300 Series

Enabling detection of printable defects and through-pellicle inspection of high-NA EUV masks



  • Inspection of EUV masks for high-NA lithography
  • Inspection of EUV masks for the current NA lithography
  • High productivity inspection with highly efficient optics and high-brightness light source “URASHIMA”


  • Quality assurance inspection during EUV mask manufacturing processes
  • Incoming EUV mask inspection and periodic quality assurance inspection at wafer fabs

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