Actinic EUV Patterned Mask Inspection System
ACTIS A300 Series
NEW
Enabling detection of printable defects and through-pellicle inspection of high-NA EUV masks
Topics
Features
- Inspection of EUV masks for high-NA lithography
- Inspection of EUV masks for the current NA lithography
- High productivity inspection with highly efficient optics and high-brightness light source “URASHIMA”
Applications
- Quality assurance inspection during EUV mask manufacturing processes
- Incoming EUV mask inspection and periodic quality assurance inspection at wafer fabs
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