Mask Edge Inspection System
MZ100
Mask edge inspection system for EUV and DUV masks
Topics
Features
- Capability to inspect EUV and DUV photomasks for leading-edge semiconductors
- Confocal optics delivering high-sensitivity inspection and high-precision measurement
- Capability to inspect mask-edge region (side face and bevel sections)
Applications
- EUV and DUV photomask edge inspection
- Defect review
- Defect size and height measurement
- Monitoring of various process metrics
Specifications
| Inspection area and Scanning method | Inspection of all regions except the 146 x 146mm2 central area of photomask. *Details below |
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