Mask Inspection System

MATRICS X9ULTRA Series

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MATRICS X9ULTRA Series

A mask inspection system designed for pellicle-less EUV mask inspection in the technology nodes of 3nm and beyond

Topics

Features

  • A mask inspection system designed for pellicle-less EUV mask inspection in the technology nodes of 3nm and beyond
  • A high-power 193nm laser light source and high NA objective lens enabling improved particle detection performance

Applications

  • Quality assurance inspection of pellicle-less EUV photomasks at wafer fabs
  • Particle inspection for EUV photomasks at mask shops

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