Mask Inspection System
MATRICS X9ULTRA Series
![MATRICS X9ULTRA Series](/en/products/assets/img/image_MATRICS_Xseries.jpg)
A mask inspection system designed for pellicle-less EUV mask inspection in the technology nodes of 3nm and beyond
Topics
Features
- A mask inspection system designed for pellicle-less EUV mask inspection in the technology nodes of 3nm and beyond
- A high-power 193nm laser light source and high NA objective lens enabling improved particle detection performance
Applications
- Quality assurance inspection of pellicle-less EUV photomasks at wafer fabs
- Particle inspection for EUV photomasks at mask shops
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