Mask Inspection System

MATRICS X9ULTRA Series

Contact / Brochures
MATRICS X9ULTRA Series

Inspection system built for EUV masks

Topics

Features

  • A mask inspection system designed for pellicle-less EUV mask inspection
  • A high-power 193nm laser light source and high NA objective lens enabling improved particle detection performance

Applications

  • Quality assurance inspection of pellicle-less EUV photomasks at wafer fabs
  • Particle inspection for EUV photomasks at mask shops

You might also be interested in

ACTIS A150
ACTIS A150

World’s first EUV patterned mask inspection system
ABICS Series E120
ABICS Series E120

Detecting printable phase defects and enabling defect management for EUV mask blanks
BASIC Series
BASIC Series

Integrated solution for detection, height measurement and cleaning of particles on the backside of EUV masks
Request for product information, brochures

Product Search

Product list
Semiconductor-related
FPD-related
Microscopes
Related information
Glossary

A collection of technical words often used with Lasertec products and technologies
Exhibitions

Schedule of events where Lasertec will exibit products
  1. Home
  2. Products
  3. Semiconductor-related
  4. MATRICS X9ULTRA Series