EUV Mask Backside Inspection and Cleaning System
BASIC Series
Integrated solution for detection, height measurement and cleaning of particles on the backside of EUV masks
Topics
Features
- Inspection optics optimized for detection of particles on the backside of EUV masks
- Measurement of the height of killer particles
- Cleaning function for removal of killer particles
- Dual pod handling system with no particle adders
- Scanning system that causes no damage on pattern surface
- Inspection time conforming to the requirement of EUV lithography in production
- Automated inspection linked with overhead hoist transport
- Compact and all-in-one design including power supply and control unit
Applications
- Incoming and periodic inspection of EUV masks at wafer fabs
- Detection, height measurement, and cleaning of particles on the backside of EUV masks
- Outgoing inspection by EUV mask shops and mask blank manufacturers
Specifications
| Dimensions | 1,550 (W) x 2,955 (D) x 2,400 (H) |
|---|---|
| Applicable mask | EUV masks (6 inch) |
| Note | Lasertec can offer a best mix of inspection, measurement and cleaning functions of the BASIC Series for your specific needs. Please contact us for more information. |
